JPH0711466Y2 - プラズマ処理装置 - Google Patents

プラズマ処理装置

Info

Publication number
JPH0711466Y2
JPH0711466Y2 JP15471488U JP15471488U JPH0711466Y2 JP H0711466 Y2 JPH0711466 Y2 JP H0711466Y2 JP 15471488 U JP15471488 U JP 15471488U JP 15471488 U JP15471488 U JP 15471488U JP H0711466 Y2 JPH0711466 Y2 JP H0711466Y2
Authority
JP
Japan
Prior art keywords
wafer
processing
semiconductor wafer
semiconductor
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP15471488U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0275724U (en]
Inventor
大二朗 工藤
Original Assignee
エム・シー・エレクトロニクス株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エム・シー・エレクトロニクス株式会社 filed Critical エム・シー・エレクトロニクス株式会社
Priority to JP15471488U priority Critical patent/JPH0711466Y2/ja
Publication of JPH0275724U publication Critical patent/JPH0275724U/ja
Application granted granted Critical
Publication of JPH0711466Y2 publication Critical patent/JPH0711466Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP15471488U 1988-11-28 1988-11-28 プラズマ処理装置 Expired - Lifetime JPH0711466Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15471488U JPH0711466Y2 (ja) 1988-11-28 1988-11-28 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15471488U JPH0711466Y2 (ja) 1988-11-28 1988-11-28 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPH0275724U JPH0275724U (en]) 1990-06-11
JPH0711466Y2 true JPH0711466Y2 (ja) 1995-03-15

Family

ID=31431692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15471488U Expired - Lifetime JPH0711466Y2 (ja) 1988-11-28 1988-11-28 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPH0711466Y2 (en])

Also Published As

Publication number Publication date
JPH0275724U (en]) 1990-06-11

Similar Documents

Publication Publication Date Title
US6780251B2 (en) Substrate processing apparatus and method for fabricating semiconductor device
US5607009A (en) Method of heating and cooling large area substrates and apparatus therefor
US6314658B2 (en) Vacuum processing apparatus and operating method therefor
US6176667B1 (en) Multideck wafer processing system
JP3122617B2 (ja) プラズマ処理装置
EP0272141A2 (en) Multiple chamber integrated process system
KR100269097B1 (ko) 기판처리장치
US6331095B1 (en) Transportation system and processing apparatus employing the transportation system
CN101208454A (zh) 晶片处理系统及制造晶片的方法
US20180282864A1 (en) Apparatus and method of turning over a substrate in a substrate processing system
CN111048444A (zh) 加热板冷却方法和基板处理装置及方法
JPH0729963A (ja) 半導体製造装置
JPH0711466Y2 (ja) プラズマ処理装置
JPH1041239A (ja) 基板処理方法
JPH01209722A (ja) 熱処理方法およひ熱処理装置
JP4358690B2 (ja) 縦型熱処理装置及びその運用方法
JPH11204535A (ja) 半導体基板の熱処理方法及び装置
KR101521464B1 (ko) 열처리 장치
USRE39824E1 (en) Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors
JP4895685B2 (ja) 基板処理装置および半導体装置の製造方法
JP2004011005A (ja) 処理装置および処理方法
JPH11111820A (ja) 基板処理装置
JPS63297567A (ja) プラズマｃｖｄ装置
JP4224192B2 (ja) 半導体装置の製造方法
JP2556297B2 (ja) プラズマ気相成長装置